High energy and high dose ion implantation
High energy and high dose ion implantation
J. Gyulai, P. L. F. Hemment, S. U. Campisano, Symposium C on High Energy Ion Implantation (1991 Strasbourg, France)
Details
- OL Work ID
- OL3842156W
Subjects
Compound semiconductorsCongressesIon bombardmentIon implantationSuperlattices as materials