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High energy and high dose ion implantation

High energy and high dose ion implantation

J. Gyulai, P. L. F. Hemment, S. U. Campisano, Symposium C on High Energy Ion Implantation (1991 Strasbourg, France)

Details

OL Work ID
OL3842156W

Subjects

Compound semiconductorsCongressesIon bombardmentIon implantationSuperlattices as materials

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