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Interferometric metrology of photomask blanks

Interferometric metrology of photomask blanks

C. J. Evans

About this book

"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2

Details

OL Work ID
OL18400436W

Subjects

PhotolithographyTestingInterferometryOptical instrumentsOptical measurements

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Book data from Open Library. Cover images courtesy of Open Library.