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New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation

New Prospects of Integrating Low Substrate Temperatures with Scaling-Sustained Device Architectural Innovation

Mohaiminul Alam, Nabil Shovon Ashraf, Shawon Alam

Details

OL Work ID
OL26484528W

Subjects

Integrated circuits, very large scale integrationLow temperature engineeringField effect transistorsMetal oxide semiconductors

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