Gate Stack and Silicide Issues in Silicon Processing
Gate Stack and Silicide Issues in Silicon Processing
P. R. Besser, J. Kittl, S. A. Campbell, S. B. Herner, L. A. Clevenger
Details
- OL Work ID
- OL21531487W
Subjects
Integrated circuits, ultra large scale integrationSilicidesGate array circuitsElectric action of points